TACKWELL #155FP
Very Fine Photo Mask Protection Tape - for protection of fine pattern

 #155FP suppresses the beam scattering in the UV parallel beam exposure process to enhance the reproducibility of 30-?m or smaller fine patterns.

Currently, when a protection film is adhered to the photo mask, it is not possible to form patterns of 50 ?m or less in width. The TACKWELL #155FP offers high transparency in the UV range and substantially reduces the number of entrained bubbles to suppress the exposure beam scattering and form fine patterns easily. It can be used for glass masks in addition to film masks. Different from current liquid and coating type protection media, #155FP can be easily attached by means of a laminator and, therefore, handling is extensively improved.

- After the application of #155FP, exposure and development are executed:

Width of formed line (um) / Line width of photo mask (um)

Entrained bubble between wires

Mechanism of lens effect

um

20

10

%

91.6

93.6

%

85.1

81.8

%

1.2

7.3

%

1.0

6.8

 High-density packaging substrate

General-purpose PWB